New Products
German startup joins e-beam initiative
The Genisys tool called Beamer serves as a data-preparation library that integrates proximity effect correction, writing strategy and resist effects
"The company is currently moving its advanced e-beam process modeling and correction technologies from R&D into production applications. At the 22-nm node and beyond, there is a serious need for these features in photomask and maskless lithography," said Ulrich Hofmann, founder and general manager of Genisys, in a statement issued by the eBeam Initiative. The membership of the eBeam Initiative includes: Advantest, Alchip Technologies, Altos Design Automation, Cadence Design Systems, CEA/Leti, D2S, Dai Nippon Printing, e-Shuttle, Fastrack Design, Fujitsu Microelectronics, Genisys GmbH, Magma Design Automation, STMicroelectronics, Tela Innovations, Toppan Printing, Virage Logic and Vistec Electron Beam Lithography Group.
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Cypress and Future Electronics jointly developed the low-cost PSoC 3 Development Board, a package showcasing the ease-of-use of Cypress's new PSoC 3 architecture.
The Future Electronics PSoC 3 development board includes a on-board debug/programmer, a CapSense touch pad interface, tricolor red/green/blue LEDs, and a user USB interface. The board is powered though USB ports and two connectors are available for I/Os and expansion boards.
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